3MS Trimethylsilane

Trimethylsilane / 3MS

Application
Trimethylsilane is used in CVD processes for depositing carbon doped silicate (CDS) low-k dielectric thin film with an oxidant precursor; typically, dielectric constant (k) from 2.7-3.1. It is adopted by many chip makers in their copper/low-k technologies with similar dielectric deposition tool sets. Using various process technologies, porous CDS low-k is also developed with reduced k values.

Product Specification
Purity       99.999%
Ar + O2        1
CO               2
CO2             1
N2                1
THC             2
H2O             1
Total-Cl       1
*ppm